Adjusted surface work function of InN films annealed at vacuum and at high-pressure N-2 conditions

作者：Liu W F; Luo Y L; Sang Y C; Bian J M; Zhao Y; Liu Y H; Qin F W^*

来源：Materials Letters, 2013, 95: 135-138.

DOI：10.1016/j.matlet.2012.12.012

• Surface work function
• InN
• Thin films
• Surfaces
• Annealing

Annealing studies were performed to investigate the effects of heat treatment on InN thin films by changing the annealing condition from vacuum to high pressure N-2. A significant variation of similar to 400 meV in the surface work function was observed for InN films. The basic principles of Kelvin probe measurement revealed that the surface band bending E-SBB is crucial in investigating the significant changes of surface work function on the InN. The stoichiometric ratio imbalance of In and N was indirectly determined to be the main cause of the variation in band bending by analyzing the X-ray diffraction and energy dispersive X-ray measurements. Thus, the annealing treatment could be an effective method to adjust the surface work function of InN by changing the annealing condition from vacuum to high pressure N-2.

• 出版日期2013-3-1
• 单位大连理工大学