Direct fabrication of micro/nano fluidic channels by electron beam lithography

作者：Koller Daniel M^*; Galler Nicole; Ditlbacher Harald; Hohenau Andreas; Leitner Alfred; Aussenegg Franz R; Kren Joachim R

来源：Microelectronic Engineering, 2009, 86(4-6): 1314-1316.

DOI：10.1016/j.mee.2008.11.025

• e-beam lithography
• Nano fluidic
• Micro fluidic
• 3D Mask fabrication
• SU-8
• Micro fluidic channel

We utilize the strongly energy dependent electron penetration properties of the negative tone electron resist SU-8 for direct fabrication of micro/nano fluidic channels. Electron beam lithography is thereby applied in a two step process. First, the SU-8 is exposed down to the substrate forming supporting structures, a second exposure step with accordingly modified exposure parameters results in elevated structures. As we demonstrate, this process allows the fabrication of precisely aligned nanoscopic fluidic channels over lengths of several millimeters. In addition, an application as microscale shadow masks for evaporation based deposition processes is discussed.

• 出版日期2009-6