科研之友
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摘要
Stress induced in [100] oriented Si circular micropillars by coatings of low pressure chemical vapor deposited B-10, SiyNx, and plasma enhanced chemical vapor deposited SiO2 were measured using micro-Raman spectroscopy. Both tensile and compressive strains in the Si micropillars were observed. Exceptionally large stresses were found to exist in some of the measured Si micropillars. The cross-sectional shapes of these structures were shown to be an important factor in correlating their strain concentrations which could fracture the micropillar.
- 出版日期2013-11
