Analysis of flicker noise in two-dimensional multilayer MoS2 transistors

作者:Kwon Hyuk Jun; Kang Hongki; Jang Jaewon; Kim Sunkook*; Grigoropoulos Costas P
来源:Applied Physics Letters, 2014, 104(8): 083110.
DOI:10.1063/1.4866785

摘要

Using low-frequency noise (LFN) analysis, we examined the quality of the semiconductor, oxide, and oxide-semiconductor interface of back-gated multilayer MoS2 transistors. We also investigated the mechanism of the LFN and extracted c exponents from the LFN behavior, 1/f(gamma); the value of gamma was %26gt;1 at negative gate bias because of active slow traps. As V-G increased, the slow traps were filled and thus gamma decreased, stabilizing at approximate to 0.95. Various other parameters extracted from the LFN indicated that the carrier number fluctuation (Delta n) model was the dominant origin of the LFN. The multilayer MoS2 structure had better noise immunity than a single-layer case in air.

  • 出版日期2014-2-24