Development of UV-Curable Resins Suitable for Reverse-Tone Lithography for Au Metamaterials Using a Print-and-Imprint Method

作者：Uehara Takuya; Sato Shinya; Ito Shunya; Yano Haruna; Nakamura Takahiro; Nakagawa Masaru^*

来源：Bulletin of the Chemical Society of Japan, 2018, 91(2): 178-186.

DOI：10.1246/bcsj.20170280

We developed a UV-curable resin (NL-SU1) suitable for screen printing with laser-drilled polyimide masks and reverse-tone nanoimprint lithography. The viscosity of the UV-curable resin composed of two bisphenol A-based monomers was adjusted to 11.0 Pa.s for the screen printing process. It was determined by photo-differential scanning calorimetry that photoinitiator Irgacure 369 was suitable for high methacrylate consumption in UV curing. The UV-curable resin after curing could be used as a top-coated resist layer on another imprinted resist layer because of its sufficient contrast in oxygen reactive ion etching and argon ion milling. We demonstrated a method for reverse-tone lithography in a print-and-imprint method to fabricate 20-nm-thick and 50-nm-linewide Au split-ring resonator arrays.

• 出版日期2018-2