摘要
(111) and (220) preferred-orientation Cu substrates were successfully produced by varying electroplating current-density. While these preferred-orientation Cu substrates reacted with Sn, serious Kirkendall voids formed at the interfaces between Sn and (111) and (220) preferred-orientation Cu substrates. Also, abnormal Cu3Sn growth occurs; the Cu3Sn layer decreased upon aging and vanished after 1000-h aging. With a prolonged 2000-h aging, a Cu3Sn layer re-grew at the Cu6Sn5/Cu interface.
- 出版日期2011
- 单位中央民族大学