Affixing N-terminal alpha-Helix to the Wall of the Voltage-dependent Anion Channel Does Not Prevent Its Voltage Gating

作者:Teijido Oscar; Ujwal Rachna; Hillerdal Carl Olof; Kullman Lisen; Rostovtseva Tatiana K*; Abramson Jeff
来源:JOURNAL OF BIOLOGICAL CHEMISTRY, 2012, 287(14): 11437-11445.
DOI:10.1074/jbc.M111.314229

摘要

The voltage-dependent anion channel (VDAC) governs the free exchange of ions and metabolites between the mitochondria and the rest of the cell. The three-dimensional structure of VDAC1 reveals a channel formed by 19 beta-strands and an N-terminal alpha-helix located near the midpoint of the pore. The position of this alpha-helix causes a narrowing of the cavity, but ample space for metabolite passage remains. The participation of the N-terminus of VDAC1 in the voltage-gating process has been well established, but the molecular mechanism continues to be debated; however, the majority of models entail large conformational changes of this N-terminal segment. Here we report that the pore-lining N-terminal alpha-helix does not undergo independent structural rearrangements during channel gating. We engineered a double Cys mutant in murine VDAC1 that cross-links the alpha-helix to the wall of the beta-barrel pore and reconstituted the modified protein into planar lipid bilayers. The modified murine VDAC1 exhibited typical voltage gating. These results suggest that the N-terminal alpha-helix is located inside the pore of VDAC in the open state and remains associated with beta-strand 11 of the pore wall during voltage gating.

  • 出版日期2012-3-30