Process and characterization study of amorphous silicon thin film prepared by MF magnetron sputtering

作者：Lin Yanghuan; Li Minghua; Shen Hui^*

来源：Acta Energiae Solaris Sinica, 2012, 33(2): 277-282.

• Amorphous silicon thin films
• Characterization studies
• Orthogonal experiment
• Preparation process
• Si substrates
• Sputtering power
• Work pressures

Amorphous silicon thin film was prepared on Si substrate by MF magnetron sputtering and its preparation process were studied by orthogonal experiment. The characterization of amorphous silicon thin film was tested by n&k testing, Raman spectroscopy and XPS. It is found that the amorphous silicon thin films prepared by MF magnetron sputtering have a larger O, C content, however, reducing the work pressure and increasing of sputtering power can effectively reduce the O, C content and get amorphous silicon thin film with better optical properties and structure.

• 出版日期2012
• 单位中山大学