摘要
Thermally induced aryl halide C-C coupling on surfaces of hydrogen-passivated germanium, Ge(001):H, has been investigated by scanning tunneling microscopy at room temperature. It has been shown that an atomic hydrogen buffer layer is essential for C-C coupling to occur. Competition between dehydrogenation of the passivating layer and dehalogenation of molecular precursors as a function of substrate temperature during the deposition of molecules is discussed.
- 出版日期2015-12-10