Aryl Halide C-C Coupling on Ge(001):H Surfaces

作者:Olszowski P; Zapotoczny B; Prauzner Bechcicki J S*; Vilas Varela M; Perez D; Guitian E; Pena D; Szymonski M
来源:Journal of Physical Chemistry C, 2015, 119(49): 27478-27482.
DOI:10.1021/acs.jpcc.5b08883

摘要

Thermally induced aryl halide C-C coupling on surfaces of hydrogen-passivated germanium, Ge(001):H, has been investigated by scanning tunneling microscopy at room temperature. It has been shown that an atomic hydrogen buffer layer is essential for C-C coupling to occur. Competition between dehydrogenation of the passivating layer and dehalogenation of molecular precursors as a function of substrate temperature during the deposition of molecules is discussed.

  • 出版日期2015-12-10