摘要

This study reports the design and analysis of a plasmonic sensor based on a heavily doped silicon and metallic grating structure working in the mid-infrared region. The numerical results show that the reflection spectrum of the phosphorous-doped Si grating structure with a dopant concentration of 1 x 20(20) has a sharp asymmetric Fano resonance dip, which is strongly dependent on the refractive index change in the surroundings. It yields a sensitivity of 8000 nm/RIU (refractive index unit) and 950 nm/RIU working in the air and water media, respectively, very high values compared with that of existing devices. Moreover, the Fano resonance caused by coupling of the Wood-Rayleigh anomaly and surface plasmon resonances is demonstrated by calculating the magnetic field and Poynting vector patterns. Further, a feasible and easy fabrication process of the sensor featuring high performance is represented.