Nanowire coating by plasma processing

作者：Cao J^*; Matsoukas T

来源：IEEE Transactions on Plasma Science, 2005, 33(2): 829-833.

DOI：10.1109/TPS.2005.844505

• materials processing
• plasma applications
• plasma CVD
• thin films
• vapor deposition

We present a plasma-based method for the deposition of hydrogenated amorphous carbon films on metallic nanowires. Gold nanowires in mixture with silica nanospheres are introduced in a capacitively coupled radio-frequency Ar plasma where they become trapped to form a dusty plasma. Isopropanol is introduced in the plasma where it reacts to produce an amorphous film of hydrogenated carbon that deposits on the suspended nanowires; and nanoparticles. The films deposited in this manner range up to about 50 nm, depending on the deposition time. Many nanowires have coatings that exhibit a high degree of fidelity, even around complex surface features such as broken and jagged edges. Film deposition on nanowires is more rapid than deposition on particles, a result that is attributed to their different charging characteristics. Observed nonuniformities in film thickness are discussed in terms of spatial distribution of the deposition rate.

• 出版日期2005-4