Atom-to-atom interactions for atomic layer deposition of trimethylaluminum on Ga-rich GaAs (001)-4 x 6 and As-rich GaAs(001)-2 x 4 surfaces: a synchrotron radiation photoemission study

作者：Pi Tun Wen^*; Lin Hsiao Yu; Liu Ya Ting; Lin Tsung Da; Wertheim Gunther K; Kwo Jueinai; Hong Minghwei

来源：Nanoscale Research Letters, 2013, 8(1): 169.

DOI：10.1186/1556-276X-8-169

• GaAs
• Al2O3
• Atomic layer deposition
• Synchrotron radiation photoemission

High-resolution synchrotron radiation photoemission was employed to study the effects of atomic-layer-deposited trimethylaluminum (TMA) and water on Ga-rich GaAs(001)-4 x 6 and As-rich GaAs(001)-2 x 4 surfaces. No high charge states were found in either As 3d or Ga 3d core-level spectra before and after the deposition of the precursors. TMA adsorption does not disrupt the GaAs surface structure. For the (4 x 6) surface, the TMA precursor existed in both chemisorbed and physisorbed forms. In the former, TMA has lost a methyl group and is bonded to the As of the As-Ga dimer. Upon water purge, the dimethylaluminum-As group was etched off, allowing the now exposed Ga to bond with oxygen. Water also changed the physisorbed TMA into the As-O-Al(CH3)(2) configuration. This configuration was also found in 1 cycle of TMA and water exposure of the (2 x 4) surface, but with a greater strength, accounting for the high interface defect density in the mid-gap region.

• 出版日期2013-4-12
• 单位清华大学