Application of hard X-ray photoelectron spectroscopy to electronic structure measurements for various functional materials

作者：Ueda S^*

来源：Journal of Electron Spectroscopy and Related Phenomena, 2013, 190: 235-241.

DOI：10.1016/j.elspec.2013.01.009

• Hard X-ray photoelectron spectroscopy
• HAXPES
• Bulk-sensitive electronic structure
• Functional materials
• Buried interfaces

The revolver undulator beamline BL15XU at SPring-8 has been constructed by National Institute for Materials Science (NIMS). We have started hard X-ray photoemission experiments for various functional materials to measure the bulk-sensitive and buried interface electronic structures at BL15XU of SPring-8 since 2006. In this paper we report the performance of the NIMS contract beamline for hard X-ray photoelectron spectroscopy (HAXPES) and recent HAXPES results for several functional materials. By utilizing the large probing depth of HAXPES, it is possible to measure bulk and buried interface electronic structures of solids. We also describe the perspectives on HAXPES at the NIMS contract beamline.

• 出版日期2013-10