Artificial sub-lam magnetic patterning by He+ ion bombardment through a mask fabricated by Ultraviolet NanoImprint Lithography (UV-NIL)

作者：Schmidt Christoph; Smolarczyk Marek; Gomer Ludmilla; Hillmer Hartmut; Ehresmann Arno^*

来源：Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms , 2014, 322: 59-62.

DOI：10.1016/j.nimb.2014.01.005

• Nano imprint lithography
• Exchange bias
• Ion bombardment
• Magnetic domain walls

Light-ion bombardment induced magnetic patterning (IBMP) is a smart method to tailor the unidirectional anisotropy in exchange-bias layer systems. If the bombardment area is limited by shadow masks, artificial magnetic patterns can be generated which are stable in remanence. A method is described where it is possible to fabricate submicron magnetic patterns over large sample areas: Ultraviolet NanoImprint Lithography (UV-NIL) in combination with IBMP. We show the fabrication of artificial magnetic patterns with dimensions between 400 and 1000 nm over cm(2) areas.

• 出版日期2014-3-1