科研之友
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摘要
The effects of argon r.f. plasma etching processes on steel samples at discharge voltages substantially lower than 300 V were studied. The removal of not only the hydrocarbon contamination of the surface but also of the native oxidic scale was investigated by means of x-ray photoelectron spectroscopy (XPS). Special attention was paid to the remaining structure of the surface after etching, using reflection high-energy electron diffraction (RHEED) to determine the influence of plasma etching on the crystallographic structure. The removal of hydrocarbons was already effective at a power of 20 W. At a power of 60 W it was possible to remove the native oxidic scale in only a few minutes. In contrast to the amorphization observed after etching at high Ar+ energies, the crystalline structure of the outermost layers was not significantly influenced by the low-energy ion etching.
- 出版日期2002-8
