摘要

This paper presents a novel 2.0kV insulated gate bipolar transistor (IGBT) with trench gate structure by using an improved N-Base layer and an N-buffer layer. The new structure leads to improvement of conductivity modulation in N(-)-Base. The numerical simulations show that the collector-emitter saturation voltage [Vce(sat)] and saturation current of new device are both lower than that of conventional IGBT with trench-gate structure. The details of physical mechanisms and analysis are also given.