科研之友
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摘要
An extremely high rate of destruction of fluorinated fullerite C60F18 by accelerated electrons was revealed. This rate was three orders of magnitude higher than that of the ordinary fullerite C-60. High rate of the modification was assumed to be caused by the efficient mechanism of fragmentation of C60F18 molecule compared to the mechanism of polymerization of fullerite C-60. The conclusion has been made that films of fluorinated fullerites are perspective as an electron-beam resist for dry nanolithography.
- 出版日期2010
