Design and Analysis of Spectrally Selective Patterned Thin-Film Cells

作者：Hajimirza Shima^*; Howell John R

来源：International Journal of Thermophysics, 2013, 34(10): 1930-1952.

DOI：10.1007/s10765-013-1495-y

• Fabrication error
• Inverse optimization
• Sensitivity analysis
• Thin-film solar cells

This paper outlines several techniques for systematic and efficient optimization as well as sensitivity assessment to fabrication tolerances of surface texturing patterns in thin film amorphous silicon (a-Si) solar cells. The aim is to achieve maximum absorption enhancement. The joint optimization of several geometrical parameters of a three-dimensional lattice of periodic square silver nanoparticles, and an absorbing thin layer of a-Si, using constrained optimization tools and numerical FDTD simulations is reported. Global and local optimization methods, such as the Broyden-Fletcher-Goldfarb-Shanno quasi-Newton method and simulated annealing, are employed concurrently for solving the inverse near-field radiation problem. The design of the silver-patterned solar panel is optimized to yield maximum average enhancement in photon absorption over the solar spectrum. The optimization techniques are expedited and improved using a novel nonuniform adaptive spectral sampling technique. Furthermore, the sensitivity of the optimally designed parameters of the solar structure is analyzed by postulating a probabilistic model for the errors introduced in the fabrication process. Monte Carlo simulations and unscented transform techniques are used for this purpose.

• 出版日期2013-10