摘要

The annealing-induced amorphization of a sputtered glass-forming Cu(51)Zr(42)Al(4)Ti(3) thin film has been clarified by in-situ transmission electron microscopy in conjunction with ex-situ atomic force microscopy and X-ray diffractometry. Upon heating of the film at low temperatures, nanocrystallization and growth of metastable sputtered crystallites occur in the amorphous matrix. Heated to 438 degrees C, within the supercooled liquid region (Delta T), the film becomes fully amorphous. At higher temperatures above Delta T, i.e. 525 degrees C, crystalline Cu(10)Zr(7) and AlTi(2) phases appear as a result of crystallization. The annealing-induced nanocrystallization and amorphization appear to be rather general and applicable to a large number of systems.