DISTRIBUTIONS OF Ti+ IMPLANTED IONS IN Nb NANOSTRUCTURED FILM DEPENDING ON IRRADIATION ANGLE AT LOW TEMPERATURES. COMPUTER SIMULATION BY SPURT.CRIS CODE

作者：Pavlenko V I^*; Sleptsov S N; Ferliy L A; Chalyy S O

来源：Problems of Atomic Science and Technology, 2014, (2): 167-173.

The SPURT. CRIS code has been used for computer simulation of the Ti+ ions implantation in the Nb nanostructured film at low temperatures. The distributions of Ti+ implanted ions were generated and analyzed depending on both the ion energy (E-ion) and irradiation angle (alpha). The ion energy and irradiation angle were varied in the range from 0.5 to 2.0 keV and from 0 degrees to 80 degrees, respectively. The maximal depths of the Ti+ implanted ions were evaluated using the generated distributions. It was shown that the maximal depth of Ti+ implanted ions in the Nb film is realized at the definite range of irradiation angles. This effect allows optimizing the process of film layers formation with the predetermined properties.

• 出版日期2014