An investigation on hysteresis process of ZnO film deposition and changes of surface morphology and wettability

作者：Wang Qing; Ba De chun^*; Zhang Yi chen; Jiang Rong heng

来源：Materials Letters, 2012, 68: 320-323.

DOI：10.1016/j.matlet.2011.10.086

• Hysteresis curve
• Physical vapor deposition
• Surfaces
• Thin films
• Wettability

Plasma Optical Emission Spectroscopy was employed to investigate hysteresis process of reactive sputtering with high purity Zn target in the presence of Ar plus O-2 plasma. An optimal working point was obtained through analyzing hysteretic curve in order to deposit high quality ZnO film. Scanning Electron Microscope was used to characterize effects of various O-2 flow rate on surface crystal structure of samples. The SEM results indicate that the structure of ZnO film is strongly dependent on O-2 flow rate at constant pressure and power. Specially, At 1.6 sccm O-2 flow rate, the sample with best crystallite structure has been observed. Energy-dispersive X-ray Spectroscopy also demonstrates the relationship between the chemical compositions of ZnO films and O-2 flow rate. The film to 1.6 sccm O-2 shows the optimal atom ratio of Zn to O and the mass ratio of Zn to O. The water contact angle measurement also shows various O-2 flow rate strongly affects wettability.

• 出版日期2012-2-1
• 单位东北大学