摘要
The effect of back biasing on the performance of a planar tunnel field-effect transistor (TFET) implemented on a silicon-on-insulator substrate is investigated. It is found that reverse back biasing reduces the subthreshold swing SS and increases the range of drain current over which SS is less than (k(B)T/q)ln(10); hence, it is effective for improving the TFET ON/OFF current ratio for low operating voltages (<= 0.5 V).
- 出版日期2011-10