Use of an energetic ion beam on the surface during physical vapor deposition

作者：Ma ZQ^*; Zheng YF; Li DL

来源：Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms , 2000, 169(1-4): 106-111.

DOI：10.1016/S0168-583X(00)00025-2

The microstructural evolution of polycrystalline TiNx alloy films deposited by de reactive magnetron sputter deposition from a Ti target in mixed Ar/N-2 discharges is reported. It is found that the films are underdense and exhibit a pronounced columnar morphology at low growth temperatures and in the absence of ion bombardment, while the addition of low-energy (E-i less than or equal to 200 eV) ion irradiation during deposition in Ar-N-2 plasmas results in film densification, defect incorporation and a more equiaxed grain structure. Low-energy ion irradiation provides increased apparent adatom mobility and, hence, larger grain size. The redistribution of elements near the surface of alloys subjected to ion bombardment is studied. The kinetics of surface composition and the distribution profiles of elements in the subsurface layer are analyzed during the transition time between two steady-state regimes of sputtering after changes in the irradiation conditions.

• 出版日期2000-6
• 单位新疆大学