Process of continuous membrane micro-deformable mirror based on SOI wafer

作者：Qiao Dayong^*; Yuan Weizheng; Tian Li

来源：Chinese Journal of Lasers, 2009, 36(SUPPL. 2): 78-82.

DOI：10.3788/CJL200936s2.0078

• Anodic bonding
• Controlled thickness
• Deep reactive ion etching
• Micro-deformable mirror
• Optical fabrication
• Reflective mirrors
• RMS roughness
• Silicon on insulator
• Silicon-on-insulators
• Single crystal silicon
• SOI wafers
• Three-layer structures
• Working range

Silicon on insulator (SOI) provides a three-layer structure of Si/SiO2/Si, and makes it possible to achieve continuous membrane micro-deformable mirror based on deep reactive ion etching (DRIE). By using the SiO2 as the self-stop layer of dry etching, a single crystal silicon reflective mirror membrane can be readily realized with uniform and precisely controlled thickness. A process based on DRIE and anodic bonding of SOI wafer/Pyrex 7740 glass was presented, and a micro-deformable mirror with 69 actuators was fabricated and tested. The micro-deformable mirror, with an aperture of 10 mm, exhibits a working range of 4.25 μm, a PV flatness of 1.2 μm and a RMS roughness of 193 nm.

• 出版日期2009
• 单位西北工业大学