A comparative study of YBCO thin film growth by inverted cylindrical magnetron sputtering and inverted cylindrical sputtering

作者：Li, YR^*; Liu, XZ; Tao, BW

来源：Journal of Superconductivity, 2001, 14(3): 443-447.

DOI：10.1023/A:1011199027407

• sputtering
• deposition process
• superconductivity
• YBCO

A comparative study of Y1Ba2Cu3O7-x (YBCO) thin film growth by inverted cylindrical magnetron sputtering and non-magnetron inverted cylindrical sputtering was clone. At the total pressure of 40 Pa epitaxial YBCO thin films with good superconducting transition properties and smooth surface were prepared by the magnetron source. Inductive measurements gave T-C0 = SM K and DeltaT(C) = 0.5 K. The full width at half maximum (FWHM) value of the rocking curve was 0.18 degrees. The average surface smoothness of the film was 250 Angstrom. With the non-magnetron source at the same total pressure. the superconducting transition properties of the YBCO thin films were not good because of intense bombardment by energetic ions. However. by raising the total pressure to 60 Pa. epitaxial YBCO thin films with good superconducting transition properties and smooth surface could be prepared by non-magnetron inverted cylindrical sputtering-T-C0 = 90.

• 出版日期2001-6
• 单位电子科技大学