摘要

CeO2-doped diamond-like carbon (DLC) films with thicknesses of 180-200 nm were deposited by unbalanced magnetron sputtering. When the CeO2 concentration is in the range 5-8%, the residual compressive stress of the deposited films is reduced by 90%, e.g. from about 4.1 GPa to 0.5 GPa, whereas their adhesion strength increases. These effects are attributed to the dissolution of CeO2 within the DLC amorphous matrix and a widening interface between the DLC film and the Si substrate, respectively.