摘要

We present a high-quality Ni/Ag/Pt Ohmic contact to p-type GaN. After the sample is annealed at 500 degrees C in O-2 ambient for 3 min, a specific contact resistance as low as 2.6 x 10(-5) Omega.cm(3) and an optical reflectivity of 82% at 460 nm are obtained. The Auger electron spectroscopy analysis shows that the Pt layer can improve the surface morphology and thermal reliability of the annealed Ag-based electrode, Ag plays a key role in achieving good ohmic contact due to the outdiffusion of Ga into Ag forming Ga vacancies which increase the hole concentration, while the surface contamination of p-type GaN is reduced by Ni.

  • 出版日期2006-8
  • 单位清华大学深圳研究生院; 集成光电子学国家重点实验室; 清华大学