Abrasion resistance of silica-based coatings prepared by atmospheric pressure plasma chemical vapor deposition for protection of polymeric surfaces

作者：Noborisaka Mayui; Mori Takanori; Horikoshi Ryohei; Shirakura Akira; Hashimoto Ayako; Suzuki Tetsuya

来源：Journal of Vacuum Science and Technology A, 2013, 31(6): 061508.

DOI：10.1116/1.4818150

Silica-based films were synthesized by the dielectric barrier discharge method under atmospheric pressure from tetramethoxysilane and O-2 diluted with N-2. In this study, the coating area was 200 mm in diameter, which could be enlarged by altering shape of the electrodes and expanding the scanning range. Even at the low temperature of 80 degrees C, the hardness of the films slightly increased up to 4.3 GPa by decreasing the tetramethoxysilane flow rate. The relative ratio of Si-O-Si (cage structure) bonds to Si-O-Si (network structure) decreased, and as a result, the films became harder. Additionally, it was found that silica-based films deposited on acrylic resin-coated polycarbonate substrates had good abrasion resistance; the minimum Delta Hz value after 1000 revolutions in the Taber abrasion tests was 2.5%. These results suggest that the silica-based films synthesized under atmospheric pressure have the potential to be used in mass production because the equipment enables low-cost and large-area synthesis. The authors find that there is potential in using atmospheric pressure plasma technology for the automobile industry.

• 出版日期2013-12