Adsorption, ordering, and chemistry of nitrobenzene on Si(100)-2 x 1

作者：Bocharov S; Teplyakov **^*

来源：Surface Science, 2004, 573(3): 403-412.

DOI：10.1016/j.susc.2004.09.044

• thermal desorption spectroscopy
• surface chemical reaction
• vibrations of adsorbed molecules
• silicon
• aromatics

Surface chemistry of nitrobenzene on Si(100)-2 x 1 has been investigated using multiple internal reflection Fourier-transform infrared spectroscopy (MIR-FTIR), Auger electron spectroscopy (AES) and thermal desorption mass spectrometry. Molecular adsorption of nitrobenzene at submonolayer coverages is dominating at cryogenic temperatures (100 K). As the surface temperature is increased to 160 K, chemical reaction involving nitro group occurs, while the phenyl entity remains intact. Thus, a barrier of approximately 40.8 kJ/mol is established for the interaction of the nitro group of nitrobenzene with the Si(100)-2 x 1 surface. Further annealing of the silicon surface leads to the decomposition of nitrobenzene. The concentration of nitrogen and oxygen remains constant on a surface within the temperature interval studied here. AES studies also suggest that the majority of carbon-containing products remain bound to the surface at temperatures as high as 1000K. The only chemical reaction leading to the release of the gaseous products is benzene formation around 670K. The amount of benzene accounts only for a few percent of the surface species, while the rest of the phenyl groups connected to the silicon surface via a nitrogen linker remain stable even at elevated temperatures, opening an opportunity for stable surface coatings.

• 出版日期2004-12-20