Analog Layout Retargeting With Process-Variation-Aware Hybrid OPC

作者：Dong Xuan^*; Zhang Lihong

来源：IEEE Transactions on Very Large Scale Integration Systems, 2018, 26(3): 594-598.

DOI：10.1109/TVLSI.2017.2773481

• Analog layout retargeting
• optical proximity correction (OPC)
• process variation (PV)
• rule-based (RB) and model-based (MB) OPCs

For high-quality analog layout retargeting, in this brief we propose a hybrid optical proximity correction (OPC) methodology, which features special handling against geometry manufacturing deviation caused by process variation (PV). Based on the unique nature of analog layouts, accuracy limitation of the rule-based OPC (RB-OPC) is compensated by geometry preprocessing operations in our proposed layout retargeting flow, and is further shrunk by a local model-based OPC postprocessing operation without incurring any chip area increment. An innovative RB PV-band correction scheme is developed to preserve analog circuit performance against possible PV. The experiments show that our analog layout retargeting flow integrated with the proposed PV-aware hybrid OPC can achieve much higher efficiency with even lower mask complexity and edge placement error compared to alternative methods.

• 出版日期2018-3